What is MOCVD engineer?
Metalorganic Chemical Vapor Deposition Engineer (MOCVD Engineer) Career. *A job as a Metalorganic Chemical Vapor Deposition Engineer (MOCVD Engineer) falls under the broader career category of Semiconductor Processing Technicians.
What is low pressure CVD?
Low pressure chemical vapor deposition (LPCVD) is a chemical vapor deposition technology that uses heat to initiate a reaction of a precursor gas on the solid substrate. This reaction at the surface is what forms the solid phase material.
What is metal organic CVD?
Metal organic CVD (MOCVD) is a CVD process for growing epitaxial films, very similar to LPCVD, and is done by flowing precursor gases over the substrate. The gases are allowed to decompose due to pyrolysis on the heated substrate surfaces to produce the desired film.
How plasma is created in PECVD?
The plasma is generally created by radio frequency (RF) (alternating current (AC)) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.
What kind of devices can be produced with MOCVD?
Devices that benefit from this technology include lasers and LEDs, solar cells, and field effect transistors (FETs). MOCVD allows for high volume production of bandgap engineered semiconducting heterostructures. MOCVD can also be used for the controlled production of 0D, 1D and 2D nanomaterials.
How are compound semiconductors used in MOCVD process?
MOCVD for Compound Semiconductor Applications. They are advantageous in many ways over silicon semiconductors. The MOCVD process is used to fabricate the multilayer structures of these compound semiconductors, which are then processed into electronic or optoelectronic devices, including solar cells, high-speed transistors, laser diodes and LEDs.
How does chemical vapor phase deposition ( MOCVD ) work?
The production of compound semiconductors involves vaporization and transportation of desired chemicals along with other gases into the reactor, where the chemicals are reacted to form the desired compound semiconductor. In the MOCVD process, a fine dose of ultra-pure gas is injected.
How is the precursor captured in a MOCVD System?
MOCVD systems utilize bubblers to vaporize the precursor allowing control of the precursor concentration, growth time, and growth rate. Some of the precursor is captured in the carrier gas stream and flows out of the bubbler to the chamber.