What is silicide formation?
The silicide formation technique of directly depositing a refractory metal on a silicon surface to form the required silicide layer employs the process of direct metallurgical reaction. In such a metallurgical reaction, metal-rich silicides generally form first, and continue to grow until all the metal is consumed.
What is silicide layer?
A silicide is a type of chemical compound that combines silicon and a (usually) more electropositive element. Silicon is more electropositive than carbon. The chemical bonds in silicides range from conductive metal-like structures to covalent or ionic.
What is silicide diffusion?
Generally, silicide layers are fast diffusion pathes for silicon point defects and other chemical elements. Due to the different linear thermal expansion coefficients of silicide materials compared to other semiconductor materials stress will be induced during thermal treatment.
What is silicide in semiconductor?
Silicide (compound of silicon with metal) is formed on gates (polysilicon), sources and drains (Si wafer) as three MOS transistor electrodes in order to reduce contact resistance to metal wiring layers to be formed later. This silicide formation also has the effect of lowering the resistance of each electrode.
What is silicide on the periodic table?
Technically the term silicide is reserved for any compounds containing silicon bonded to a more electropositive element. Binary silicon compounds can be grouped into several classes. Saltlike silicides are formed with the electropositive s-block metals.
What is the chemical formula for silicide?
Lithium silicide (Li7Si2) | Li7Si2+5 – PubChem.
What is the use of silicide?
Thin-film silicide layers are used as ohmic contacts, interconnects, and as Schottky barriers for integrated circuits in microelectronic devices due to their low electrical resistivity and good compatibility with silicon substrates relative to polycrystalline silicon.
What is the main advantage of Salicide process?
These silicides have fairly low resistivity and good high-temperature-stability. The self-aligned-silicide (salicide) process is widely used in integrated circuits to reduce polysilicon gate resistance and source/drain contact resistance. The self-aligned-silicide technology possesses a number of advantages.
What is the function of Salicide process?
The term salicide refers to a technology used in the microelectronics industry used to form electrical contacts between the semiconductor device and the supporting interconnect structure.
What are silicides used for?
Abstract. Metallic silicides and germanides are used as contact materials on source/drain and gate in metal oxide semiconductor (MOS) structures such as transistors or memories. They are fabricated by reaction between a metal or a metallic alloy thin film and the Si (Ge) substrate.
Is tungsten silicide a metal?
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material….Tungsten disilicide.
| Names | |
|---|---|
| CAS Number | 12039-88-2 |
| 3D model (JSmol) | Interactive image |
| ECHA InfoCard | 100.031.723 |
| PubChem CID | 16212546 |
What’s an example of a binary compound?
Once again, a binary compound is a substance composed of exactly two different elements, which are substances that cannot be simplified further by chemical means. Examples of binary compounds include H2O, H2S, and NH3.